Semiconductor Applications

​Industry (Facility)
​Service
​Parameter
​Range
​Background
​Teledyne Model
​Bulk gas analysis

​Ultra high purity inert gases used in fabrication of wafers
​PPB O2
​0-50 ppb
​UHP - N2, H2, AR and He
UltraTrace 3000​
​​​​​1. Gas phase etching - blanketing
2. Annealing furnace - blanketing
3. Desposition of Dopant - carrier gas
4. Pipe line verification - leak check
5. Analysis at point of use - at tool location
​Excimer laser system
​Laser exciter / F2 mixer gases
​Percent F2
​0-2, 0-7%​
​He or Neon
Series 6000 UV​